Phase locked second harmonic etalon localization

Author

Roppo, V. ; Aguanno, G.D. ; Cojocaru, C. ; Raineri, F. ; Trull, J. ; Vilaseca, R. ; Raj, R. ; Scalora, M.

Author_Institution

Dept. de Fis. i Eng. Nucl., Univ. Politec. de Catalunya, Terrassa, Spain

fYear

2009

fDate

14-19 June 2009

Firstpage

1

Lastpage

1

Abstract

During the last decades a phase locking phenomenon has been observed for second harmonic (SH) generation but only recently it was recognized as such in systematic studies. The general solution of the SHG from a linear/nonlinear boundary layer is composed of one reflected and two forward propagating components. We show that the conversion efficiency of the PL SH component may be substantially increased when propagation occurs in a cavity designed to be resonant for the FF. Designing cavities with higher Q-factor the SH efficiency can be improved by several orders of magnitude. This PL effect stands also for the third harmonic generation.

Keywords

Q-factor; cavity resonators; light interferometry; optical design techniques; optical harmonic generation; Q-factor; forward propagating component; linear boundary layer; nonlinear boundary layer; optical phase locking; resonant cavity design; second harmonic etalon localization; second harmonic generation; Absorption; Displays; Gallium arsenide; Nonlinear optics; Optical harmonic generation; Optical pumping; Optical refraction; Partial differential equations; Refractive index; Resonance;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-4079-5

Electronic_ISBN

978-1-4244-4080-1

Type

conf

DOI

10.1109/CLEOE-EQEC.2009.5196535

Filename

5196535