Enhancement of the two-photon absorption and nonlinear-optical refraction in mesoporous silicon

Author

Golovan, L.A. ; Kopylovsky, M.A. ; Zabotnov, S.V. ; Piskunov, N.A. ; Gayvoronsky, V. Yo ; Kashkarov, P.K. ; Timoshenko, V.Yu.

Author_Institution

Phys. Dept., M.V. Lomonosov Moscow State Univ., Lomonosov, Russia

fYear

2009

fDate

14-19 June 2009

Firstpage

1

Lastpage

1

Abstract

The mode-locked Nd:YAG laser radiation (1.064 mum, 40 ps) transmitted through the samples was employed to study the two-photon absorption and nonlinear refraction of porous silicon. The mesoporous Si sample demonstrates self-focusing. The nonlinear refraction at low laser intensities and two-photon absorption at high laser intensities are sensitive to the laser radiation polarization. The light self-action mechanism demonstrated at low intensities tends to be saturated.

Keywords

elemental semiconductors; light polarisation; mesoporous materials; nonlinear optical susceptibility; optical materials; optical self-focusing; porous semiconductors; refractive index; silicon; two-photon processes; Si; laser intensities; laser radiation polarization; mesoporous silicon sample; mode-locked laser radiation; nonlinear refraction; porous silicon; self-action mechanism; self-focusing; time 40 ps; two-photon absorption; wavelength 1.064 mum; Absorption; Birefringence; Crystallization; Infrared spectra; Mesoporous materials; Nonlinear optics; Optical films; Optical materials; Optical refraction; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-4079-5

Electronic_ISBN

978-1-4244-4080-1

Type

conf

DOI

10.1109/CLEOE-EQEC.2009.5196537

Filename

5196537