In-line wafer inspection data warehouse for automated defect limited yield analysis

Author

Iwata, Hisafumi ; Ono, Makoto ; Konishi, Junko ; Isogai, Seiji ; Furutani, Takashi

Author_Institution

Production Eng. Res. Lab., Hitachi Ltd., Yokohama, Japan

fYear

2000

fDate

2000

Firstpage

124

Lastpage

129

Abstract

A data warehouse approach for the automation of process zone-by-zone defect limited yield analysis is presented in this paper. The system employs pre-calculation of adder defects extraction and clustered defects recognition, a newly developed wafer-wise defect record structure, and a graphical user interface purpose-designed for data selection navigation. Analysis time can be reduced to less than 1% of that of benchmarked conventional procedures

Keywords

automatic testing; data analysis; data warehouses; electronic engineering computing; fault diagnosis; graphical user interfaces; inspection; integrated circuit testing; integrated circuit yield; pattern clustering; adder defects extraction; automated analysis; clustered defect recognition; clustered defects recognition; data selection navigation; data warehouse; graphical user interface; in-line wafer inspection; intelligent data analysis; wafer-wise defect record structure; zone-by-zone analysis; Circuit faults; Data analysis; Data warehouses; Inspection; Instruments; Integrated circuit yield; Laboratories; Manufacturing processes; Optical microscopy; Production engineering;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI

Conference_Location

Boston, MA

ISSN

1078-8743

Print_ISBN

0-7803-5921-6

Type

conf

DOI

10.1109/ASMC.2000.902570

Filename

902570