DocumentCode :
2866629
Title :
A comparison of extra material critical area extraction methods
Author :
Allan, Gerard A.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
fYear :
2000
fDate :
2000
Firstpage :
142
Lastpage :
151
Abstract :
The paper reports a comparison of efficient methods of estimating extra material critical area of any angled IC layout using three different techniques: shape shifting and dot throwing and sampling. All of these techniques are implemented using the same polygon libraries and are optimised to make best use of the library features. This allows an accurate comparison of the techniques with minimal dependence on the specific implementation. The results presented here indicate that the shape shifting technique is considerably more efficient in the analysis of smaller circuit layouts but does not scale well to larger designs. For general yield prediction of large chips an efficient dot throwing implementation can be used but a sampled extraction is as much as an order of magnitude faster
Keywords :
circuit layout CAD; integrated circuit layout; integrated circuit yield; software libraries; angled IC layout; dot throwing; extra material critical area extraction methods; polygon libraries; sampling; shape shifting; yield prediction; Circuit analysis; Circuit faults; Eyes; Geometry; Integrated circuit layout; Libraries; Random number generation; Sampling methods; Shape; Tellurium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location :
Boston, MA
ISSN :
1078-8743
Print_ISBN :
0-7803-5921-6
Type :
conf
DOI :
10.1109/ASMC.2000.902576
Filename :
902576
Link To Document :
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