• DocumentCode
    2866787
  • Title

    SmartBitTM: bitmap to defect correlation software for yield improvement

  • Author

    Merino, Miguel A. ; Cruceta, Sergio ; Garcia, Aljiredo ; Recio, Miguel

  • Author_Institution
    Lucent Technol., Madrid, Spain
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    194
  • Lastpage
    198
  • Abstract
    The need of higher yields on the wafer-manufacturing environment is pushing the yield analysts to develop new techniques and tools for yield improvement. With this scope, we present SmartBitTM, a software tool that provides detailed information about yield limiters by correlating bitmap to in-line defect data in an automatic mode, expediting the yield learning task. Based on the spatial correlation of bitmap data and the information of defects coming from the in-line inspections, SmartBitTM provides a pareto where yield loss sources are separated and weighted by impact. SmartBitTM also offers detailed information about the killer defects (defect class, origin, size, kill ratio and more) into a set of reports specially designed to obtain an overall view about the main problems affecting the fab yield. This is the key to fast and efficient yield learning. These reports are generated automatically using data from the full production of memory-products enhancing the reliability and completeness of the analysis
  • Keywords
    diagnostic expert systems; electronic engineering computing; inspection; integrated circuit yield; report generators; software tools; spatial reasoning; SmartBit; automatic mode; bitmap to defect correlation software; code layout database; fast efficient yield learning; in-line defect data; in-line inspections; killer defects; massive analysis; memory-products; overlapping area; reliability; reporting tool; software tool; spatial correlation; wafer-manufacturing; yield improvement; yield learning task; yield limiters; yield loss sources; Data mining; Inspection; Manufacturing; Monitoring; Production facilities; Software tools; Statistical analysis; Testing; Tin; Uncertainty;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-5921-6
  • Type

    conf

  • DOI
    10.1109/ASMC.2000.902586
  • Filename
    902586