DocumentCode
2867041
Title
GC hard mask open tool CD monitoring and matching
Author
Yu, Chien ; Bennett, Del ; Brown, Jeffrey
Author_Institution
Adv. Semicond. Technol. Center, IBM Microelectron., East Fishkill, NY, USA
fYear
2000
fDate
2000
Firstpage
274
Lastpage
277
Abstract
Critical dimension control of gate stack hard mask open is essential to good process yield. A sector monitoring scheme was developed to provide prompt feedback of any litho or etch process drift to protect product jobs. To match GC hard mask open CDs from multiple etch tools oxygen gas flow was employed to calibrate the CDs and provide the matching conditions for all the etch chambers
Keywords
masks; process monitoring; sputter etching; CD matching; critical dimension control; etch tool; gate stack hard mask open; lithography; oxygen gas flow calibration; process yield; sector monitoring; semiconductor processing; Condition monitoring; Etching; Feedback; Fluid flow; Microelectronics; Plasma measurements; Polymers; Protection; Random access memory; Stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
0-7803-5921-6
Type
conf
DOI
10.1109/ASMC.2000.902600
Filename
902600
Link To Document