Title :
Pilot studies of the manufacturing worthiness of mixed chemistry processings in a MERIE plasma tool
Author :
Yang, Jack ; Zhang, Luke ; Tsui, Joshua ; Jiang, Anbei ; Sun, Jennifer ; Vaidya, Kaushik ; Wu, Robert
Abstract :
This paper presents ground level feasibility study of mix-run capability on applications of metal via etches in a simulated production environment. A mini-marathon was set up to understand any particulate problems and process shift during mix-run in a MERIE plasma etch tool-a commercially available Super e chamber. Particulate, oxide and PR etch rate data will be shown to demonstrate that Super e is a production worthy etch tool for mix-run with different chemistries on metal via etch applications
Keywords :
metallisation; sputter etching; surface contamination; MERIE plasma tool; Super e chamber; metal via etching; mix-run; mixed chemistry processing; particulate contamination; semiconductor manufacturing; Etching; Foundries; Manufacturing processes; Monitoring; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma simulation; Production; Radio frequency;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-5921-6
DOI :
10.1109/ASMC.2000.902627
