• DocumentCode
    2867483
  • Title

    Using overall equipment effectiveness (OEE) and the equipment improvement process (ET) to improve Fab throughput

  • Author

    Freck, Robert W.

  • Author_Institution
    Resource Dynamics Int., Boca Raton, FL, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    469
  • Lastpage
    471
  • Abstract
    Total Productive Manufacturing has been used for many years as a tool to help Semiconductor companies improve Equipment reliability, involve the Workforce In Equipment care, improve the Maintenance function, and improve overall Fab cleanliness and Safety. Almost all chipmakers have one form or another of TPM in place. However, as with many improvement processes, many of the TPM promises have yet to be met. Even in mature TPM implementations, some serious questions need to be asked
  • Keywords
    semiconductor device manufacture; equipment improvement process; overall equipment effectiveness; semiconductor fab; throughput; total productive manufacturing; Electronics industry; Maintenance; Manufacturing processes; Product safety; Resource management; Safety devices; Semiconductor device manufacture; Semiconductor device reliability; Semiconductor materials; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2000 IEEE/SEMI
  • Conference_Location
    Boston, MA
  • ISSN
    1078-8743
  • Print_ISBN
    0-7803-5921-6
  • Type

    conf

  • DOI
    10.1109/ASMC.2000.902631
  • Filename
    902631