Title :
The holographic mask aligner
Author :
Gray, S. ; Clube, F. ; Struchen, D.
Author_Institution :
Holtronic Technol. SA, Switzerland
Abstract :
Total internal reflection holography has successfully been implemented into an exposure tool for microlithography. The operation of this system, the world´s first holographic mask aligner, is described, and the key components (focus, alignment and the holographic mask) are discussed
Keywords :
holography; photolithography; alignment; exposure tool; focus; holographic mask aligner; key components; microlithography; total internal reflection holography;
Conference_Titel :
Holographic Systems, Components and Applications, 1993., Fourth International Conference on
Conference_Location :
Neuchatel
Print_ISBN :
0-85296-578-8
