DocumentCode
286769
Title
The holographic mask aligner
Author
Gray, S. ; Clube, F. ; Struchen, D.
Author_Institution
Holtronic Technol. SA, Switzerland
fYear
1993
fDate
13-15 Sep 1993
Firstpage
265
Lastpage
270
Abstract
Total internal reflection holography has successfully been implemented into an exposure tool for microlithography. The operation of this system, the world´s first holographic mask aligner, is described, and the key components (focus, alignment and the holographic mask) are discussed
Keywords
holography; photolithography; alignment; exposure tool; focus; holographic mask aligner; key components; microlithography; total internal reflection holography;
fLanguage
English
Publisher
iet
Conference_Titel
Holographic Systems, Components and Applications, 1993., Fourth International Conference on
Conference_Location
Neuchatel
Print_ISBN
0-85296-578-8
Type
conf
Filename
263282
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