• DocumentCode
    286785
  • Title

    Multiplexed static and dynamic photorefraction at 780 nm in Bi12SiO20

  • Author

    Mailis, S. ; Vainos, N.A.

  • Author_Institution
    Inst. of Electr. Structure & Laser Found. for Res. & Technol., Hellas, Greece
  • fYear
    1993
  • fDate
    13-15 Sep 1993
  • Firstpage
    174
  • Lastpage
    179
  • Abstract
    The authors report preliminary results on the observation of multiplexed dynamic and static photorefractive behavior in the diffusion regime, at 780 nm in BSO. In the present case the dynamic gratings follow the expected response but the static gratings exhibit a lifetime which is nearly four orders of magnitude larger than the dynamic gratings at quite high erasing beam intensities. In addition both type of gratings exhibit comparable saturated diffraction efficiency values. Those effects may be attributed to strong participation of at least two distinct PR centers
  • Keywords
    bismuth compounds; holographic gratings; multiwave mixing; photorefractive materials; 780 nm; Bi12SiO20; diffusion regime; donor-acceptor states; dynamic gratings; dynamic photorefraction; four-wave mixing; holographic gratings; multiplexed photorefractive behaviour; saturated diffraction efficiency; static gratings; static photorefractive; trapped holes;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Holographic Systems, Components and Applications, 1993., Fourth International Conference on
  • Conference_Location
    Neuchatel
  • Print_ISBN
    0-85296-578-8
  • Type

    conf

  • Filename
    263298