DocumentCode
286785
Title
Multiplexed static and dynamic photorefraction at 780 nm in Bi12SiO20
Author
Mailis, S. ; Vainos, N.A.
Author_Institution
Inst. of Electr. Structure & Laser Found. for Res. & Technol., Hellas, Greece
fYear
1993
fDate
13-15 Sep 1993
Firstpage
174
Lastpage
179
Abstract
The authors report preliminary results on the observation of multiplexed dynamic and static photorefractive behavior in the diffusion regime, at 780 nm in BSO. In the present case the dynamic gratings follow the expected response but the static gratings exhibit a lifetime which is nearly four orders of magnitude larger than the dynamic gratings at quite high erasing beam intensities. In addition both type of gratings exhibit comparable saturated diffraction efficiency values. Those effects may be attributed to strong participation of at least two distinct PR centers
Keywords
bismuth compounds; holographic gratings; multiwave mixing; photorefractive materials; 780 nm; Bi12SiO20; diffusion regime; donor-acceptor states; dynamic gratings; dynamic photorefraction; four-wave mixing; holographic gratings; multiplexed photorefractive behaviour; saturated diffraction efficiency; static gratings; static photorefractive; trapped holes;
fLanguage
English
Publisher
iet
Conference_Titel
Holographic Systems, Components and Applications, 1993., Fourth International Conference on
Conference_Location
Neuchatel
Print_ISBN
0-85296-578-8
Type
conf
Filename
263298
Link To Document