• DocumentCode
    2868722
  • Title

    High frequency behaviour of electron transport in silicon and its implication for drain conductance of MOS transistors

  • Author

    Prasad, B. ; George, P.J. ; Shekhar, Chandra

  • Author_Institution
    Dept. of Electron. Sci., Kurukshetra Univ., India
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    491
  • Lastpage
    494
  • Abstract
    Drain conductance gd is an important small signal parameter of the MOS transistor: Very small values of drain conductance are crucial to realizing high-gain amplifiers. This paper studies high-frequency small signal behaviour of electron transport in silicon under biasing electric fields that are typical of MOS channels in the saturation region using Monte Carlo technique. It is found that the small signal mobility, which is very small at low frequencies, becomes large at high frequencies of the order of 1012-1013 Hz. This behaviour indicates that in those MOS devices where velocity saturation is the cause of drain current saturation the drain conductance at high frequencies will become large. This will substantially reduce amplifier gains at these frequencies
  • Keywords
    MOSFET; Monte Carlo methods; carrier mobility; digital simulation; elemental semiconductors; semiconductor device models; silicon; 1E12 to 1E13 Hz; MOS channels; MOS transistors; Monte Carlo technique; Si; biasing electric fields; drain conductance; drain current saturation; electron transport; high-gain amplifiers; saturation region; small signal mobility; small signal parameter; velocity saturation; Acoustic scattering; Charge carriers; Electric fields; Electrons; Frequency; MOSFETs; Monte Carlo methods; Optical scattering; Silicon; Steady-state;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Design, 2001. Fourteenth International Conference on
  • Conference_Location
    Bangalore
  • ISSN
    1063-9667
  • Print_ISBN
    0-7695-0831-6
  • Type

    conf

  • DOI
    10.1109/ICVD.2001.902706
  • Filename
    902706