DocumentCode
2869695
Title
Direct IC pattern generation by laser writing
Author
Moulic, J. ; Kleinfelder, W.
Author_Institution
IBM Corp, Poughkeepsie, NY, USA
Volume
XXIII
fYear
1980
fDate
13-15 Feb. 1980
Firstpage
210
Lastpage
211
Abstract
A flexible IC pattern-generating laser, tool enabling modification of features by direct photoresist exposure, while viewing existing patterns, will be covered. Technique eliminates need for precision registration alignment.
Keywords
Aluminum; Chemical lasers; Control systems; Laser modes; Laser transitions; Optical control; Optical design; Power lasers; Resists; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1980 IEEE International
Conference_Location
San Francisco, CA, USA
Type
conf
DOI
10.1109/ISSCC.1980.1156073
Filename
1156073
Link To Document