Title :
Symbol Synchronization Algorithm Based on Pseudo-superimposed Zadoff-Chu in Advanced-LTE
Author :
Yan-bo, Tang ; Wan-cheng, Ge
Author_Institution :
Electron. & Inf. Eng., Tongji Univ., Shanghai, China
Abstract :
In LTE system, maximum likelihood algorithm based on cyclic prefix is used to accomplish the symbol and slot synchronization. Zadoff-Chu sequences finish frame synchronization and cell search. But in low signal-to-noise ratio AWGN channels and multi-path fading channels, the maximum likelihood peak values are not stable in the right place due to high noise effects, multi-path delays and Doppler effects respectively. In this paper a Pseudo-superimposed Zadoff-Chu sequence has been proposed. Zadoff-Chu sequence is inserted equip-spaced as reference signals in frequency domain, after IFFT reference signals have been transformed into several periodic sequences in time domain. These sequences have good auto-correlation as well as in frequency domain. In contrast to existing synchronization schemes, the proposed architecture has the advantage of better synchronization accuracy and higher data throughput since it doesn´t need extra superimposed data in frequency domain or in time domain.
Keywords :
3G mobile communication; AWGN channels; Doppler shift; fading channels; fast Fourier transforms; maximum likelihood estimation; multipath channels; Doppler effects; IFFT reference; LTE system; autocorrelation; cyclic prefix; frequency domain; maximum likelihood algorithm; multi-path fading channels; pseudo-superimposed Zadoff-Chu; signal-to-noise ratio AWGN channels; slot synchronization; symbol synchronization algorithm; time domain; AWGN channels; Additive white noise; Delay effects; Doppler effect; Fading; Frequency domain analysis; Frequency synchronization; Gaussian noise; PSNR; Signal to noise ratio; LTE; OFDM; Pseudo-superimposed; Symbol Synchronization;
Conference_Titel :
Information Processing, 2009. APCIP 2009. Asia-Pacific Conference on
Conference_Location :
Shenzhen
Print_ISBN :
978-0-7695-3699-6
DOI :
10.1109/APCIP.2009.44