• DocumentCode
    2871132
  • Title

    Nanoimprint lithography of topology optimized photonic crystal devices

  • Author

    Bilenberg, Brian ; Frandsen, Lars Hagedorn ; Nielsen, Theodor ; Vogler, Marko ; Borel, Peter Ingo ; Kristensen, Anders

  • Author_Institution
    MIC - Dept. of Micro & Nanotechnol., Tech. Univ. of Denmark, Lyngby
  • fYear
    2006
  • fDate
    21-26 May 2006
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.
  • Keywords
    electron beam lithography; nanolithography; nanopatterning; nanophotonics; optical elements; optical fabrication; photonic crystals; soft lithography; nanoimprint lithography; pattern replication; stamp patterns; thin e-beam resist; topology optimized photonic crystal devices; Electron beams; Etching; Nanolithography; Nanoscale devices; Optical devices; Photonic crystals; Resists; Silicon; Substrates; Topology; (130.3120) Integrated optics devices; (220.4000) Microstructure fabrication;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
  • Conference_Location
    Long Beach, CA
  • Print_ISBN
    978-1-55752-813-1
  • Electronic_ISBN
    978-1-55752-813-1
  • Type

    conf

  • DOI
    10.1109/CLEO.2006.4628228
  • Filename
    4628228
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2871132