Title :
Nanoimprint lithography of topology optimized photonic crystal devices
Author :
Bilenberg, Brian ; Frandsen, Lars Hagedorn ; Nielsen, Theodor ; Vogler, Marko ; Borel, Peter Ingo ; Kristensen, Anders
Author_Institution :
MIC - Dept. of Micro & Nanotechnol., Tech. Univ. of Denmark, Lyngby
Abstract :
We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.
Keywords :
electron beam lithography; nanolithography; nanopatterning; nanophotonics; optical elements; optical fabrication; photonic crystals; soft lithography; nanoimprint lithography; pattern replication; stamp patterns; thin e-beam resist; topology optimized photonic crystal devices; Electron beams; Etching; Nanolithography; Nanoscale devices; Optical devices; Photonic crystals; Resists; Silicon; Substrates; Topology; (130.3120) Integrated optics devices; (220.4000) Microstructure fabrication;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4628228
