Title :
NiW-micro springs for chip connection
Author :
Krüger, C. ; Mokwa, W. ; Schnakenberg, U.
Author_Institution :
Inst. for Mater. in Electr. Eng., Rheinisch-Westfalische Tech. Hochschule, Aachen, Germany
Abstract :
The characterisation of planar electroplated NiW micro springs for temporary connection of Flip Chips is presented. Four micro spring types with different properties were designed. FEM-analysis was used to simulate the spring characteristics for a force of 20 mN at a vertical displacement up to 50 μm. Micro springs were fabricated using electroplating of NiW and a sacrificial copper layer etching process. Three versions of elliptically shaped contacts elements with self-alignment capabilities for Flip Chip bumps were realised on top of the micro springs. At the required contact force of 20 mN a contact resistance of 400 mΩ was observed using a Au80Sn20 solder ball as a probe.
Keywords :
contact resistance; electroplating; etching; finite element analysis; flip-chip devices; micromachining; micromechanical devices; nickel alloys; tungsten alloys; 400 mohm; FEM; NiW; contact resistance; copper layer etching process; electroplated NiW micro springs; flip chips connection; self-alignment; spring characteristics; Assembly systems; Backplanes; Bars; Circuit testing; Contacts; Copper; Flip chip; Springs; Stress; System testing;
Conference_Titel :
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN :
0-7803-8265-X
DOI :
10.1109/MEMS.2004.1290536