مرکز منطقه ای اطلاع رساني علوم و فناوري

DocumentCode :

2872866

Title :

Trend for future silicon technology

Author :

Ohmi, Tadahiro

Author_Institution :

Tohoku University

fYear :

1994

fDate :

1994

Keywords :

Argon; Copper; Epitaxial growth; Large scale integration; MOSFETs; Neurons; Oxidation; Silicon; Threshold voltage; Ultra large scale integration;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International

Type :

conf

DOI :

10.1109/EDMS.1994.771098

Filename :

771098

Link To Document :