• DocumentCode
    2872866
  • Title

    Trend for future silicon technology

  • Author

    Ohmi, Tadahiro

  • Author_Institution
    Tohoku University
  • fYear
    1994
  • fDate
    1994
  • Keywords
    Argon; Copper; Epitaxial growth; Large scale integration; MOSFETs; Neurons; Oxidation; Silicon; Threshold voltage; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.771098
  • Filename
    771098
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2872866