• DocumentCode
    2873002
  • Title

    Effect of plasma treatment of a-SiOxNy/a-SiNx gate insulators on a-Si:H thin-film transistor

  • Author

    Tean Sen Jen ; Shyue Ter Leu ; Wen Chin Tsay ; Jyh Wong Hong

  • Author_Institution
    National Chiao Tung University
  • fYear
    1994
  • fDate
    1994
  • Firstpage
    38354
  • Lastpage
    38719
  • Keywords
    Glass; Optical films; Plasma density; Plasma sources; Plasma stability; Plasma temperature; Radio frequency; Stress; Substrates; Thin film transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.771106
  • Filename
    771106
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2873002