DocumentCode :
2873002
Title :
Effect of plasma treatment of a-SiOxNy/a-SiNx gate insulators on a-Si:H thin-film transistor
Author :
Tean Sen Jen ; Shyue Ter Leu ; Wen Chin Tsay ; Jyh Wong Hong
Author_Institution :
National Chiao Tung University
fYear :
1994
fDate :
1994
Firstpage :
38354
Lastpage :
38719
Keywords :
Glass; Optical films; Plasma density; Plasma sources; Plasma stability; Plasma temperature; Radio frequency; Stress; Substrates; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
Type :
conf
DOI :
10.1109/EDMS.1994.771106
Filename :
771106
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2873002
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