Title :
Radiation hardness of fluorinated oxides prepared by liquid phase deposition method following rapid thermal oxidation
Author :
Lu, WeiShin ; Chou, Jenq Shiuh ; Lee, Si-Chen ; Hwu, Jenn Gow
Author_Institution :
National Taiwan University
Keywords :
Atomic layer deposition; Cleaning; Electrons; Hafnium; Ionizing radiation; Oxidation; Radiation effects; Rapid thermal processing; Temperature; Thermal engineering;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.771109
