• DocumentCode
    2873273
  • Title

    Metallic-CNT and Non-uniform CNTs Tolerant Design of CNFET-based Circuits Using Independent N2-Transistor Structures

  • Author

    Ghavami, B. ; Raji, M. ; Pedram, H.

  • Author_Institution
    Dept. of Comput. Eng. & Inf. Technol., Amirkabir Univ. of Technol., Tehran, Iran
  • fYear
    2011
  • fDate
    4-6 July 2011
  • Firstpage
    242
  • Lastpage
    247
  • Abstract
    Carbon Nanotube Field Effect Transistors (CNFETs), consisting of semi conducting Carbon Nanotubes (CNTs), show great promise as extensions to silicon CMOS. However, imperfections related to CNT growth process result in metallic and non-uniform CNTs leading to CNFET failures. This paper investigates a defect tolerant technique for CNFETs which adds redundancy at the transistor level to provide a built-in immunity to metallic and non-uniform CNTs. The proposed technique is based on replacing each transistor by independent N2 series-parallel/parallel-series transistor structures. The technique is adopted to use single directional independence inherent in CNTs to guarantee immunity to both open and short defects as validated by theoretical analysis and experimental results. As demonstrated by extensive simulation results, the proposed technique achieves 1-part-per-bilion failure rate in a typical CNFET fabrication process.
  • Keywords
    CMOS integrated circuits; carbon nanotubes; field effect transistors; C; CMOS process; CNFET fabrication process; CNFET-based circuit; N2 series-parallel-parallel-series transistor structure; carbon nanotube field effect transistor; defect tolerant technique; independent N2-transistor structure; metallic-CNT tolerant design; nonuniform CNT tolerant design; semiconducting CNT; CNTFETs; Correlation; Layout; Logic gates; Periodic structures; Redundancy; Carbon Nanotube Field Effect Transistor (CNFET); Carbon nanotube; Correlation; Defect tolerance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI (ISVLSI), 2011 IEEE Computer Society Annual Symposium on
  • Conference_Location
    Chennai
  • ISSN
    2159-3469
  • Print_ISBN
    978-1-4577-0803-9
  • Type

    conf

  • DOI
    10.1109/ISVLSI.2011.68
  • Filename
    5992487