VLSI lithography for the 80s

Progress in VLSI depends upon continuing improvement in lithography. While optical lithography is dominant at present, the movement to micron and sub-mlcron resolution with commensurate overlay presents severe challenges. Already, limitations due to the wavelength of light are being encountered, and there are proponents of short wavelength radiation technologies using x-ray and E-beams. The panel will discuss the alternatives and compare their capabilities and limitations.