Title :
Fault location using electron beam current absorbed in LSI interconnects
Author :
Mizukoshi, K. ; Oyamada, T. ; Shimase, A. ; Matsumoto, Y. ; Yorisaki, S. ; Majima, T.
Author_Institution :
Renesas Technol. Corp., Hyogo, Japan
Abstract :
This paper introduced the developed apparatus named electron beam absorbed current (EBAC) to locate fault sites in LSI interconnects. This technique has a potential to become an effective tool and is driven forward to extended applications.
Keywords :
electron beam testing; integrated circuit interconnections; integrated circuit testing; large scale integration; EBAC; LSI interconnects; electron beam absorbed current; fault location; Circuit analysis; Circuit faults; Circuit testing; Electrical fault detection; Electron beams; Failure analysis; Fault location; Integrated circuit interconnections; Large scale integration; Probes;
Conference_Titel :
Future of Electron Devices, 2004. International Meeting for
Print_ISBN :
0-7803-8423-7
Electronic_ISBN :
0-7803-8424-5
DOI :
10.1109/IMFEDK.2004.1566393
