• DocumentCode
    2874024
  • Title

    Photoluminescence and photoresponse properties of aluminum doped β-FeSi2

  • Author

    Maeda, Yoshihito ; Terai, Yoshikazu

  • Author_Institution
    Dept. of Energy Sci. & Technol., Kyoto Univ., Japan
  • fYear
    2004
  • fDate
    26-28 July 2004
  • Firstpage
    67
  • Lastpage
    68
  • Abstract
    Orthorhombic FeSi2 (β-FeSi2) has been known as one of promising semiconductors for Si monolithic photonics circuits. β-FeSi2 shows clear light emission and photoresponse near 1.55 μm in wavelength and a high refractive index (>5.8) (Lange, 1997). These basic optical properties are appropriate to Si optoelectronic integrated circuits (Si-OEIC) consisting of Si waveguides being a crucial technology for monolithic fabrication. The monolithic fabrication of 1.55 μm-light emitting diodes and IR-photodetectors (Maeda, 2000) connected effectively with the Si waveguide can be made possibly by conventional fine ion beam synthesis (IBS) procedures of β-FeSi2. However, detailed mechanism of optical processes in β-FeSi2 has not been well understood. In order to obtain more intense 1.55 μm-emission and high sensitivity, an advanced technology for improvement of optoelectronics performance should be required. In this work, we have found pronounced effects of the Al-doping into β-FeSi2/Si heterostructures on the light emission and photovoltaic properties.
  • Keywords
    elemental semiconductors; iron compounds; photoluminescence; photovoltaic effects; refractive index; semiconductor doping; silicon; 1.55 micron; FeSi2-Si; IR photodetectors; ion beam synthesis; light emission; light emitting diodes; monolithic photonics circuits; optical processes; optical properties; optoelectronic integrated circuits; photoluminescence; photoresponse properties; photovoltaic properties; refractive index; Aluminum; Optical device fabrication; Optical refraction; Optical sensors; Optical variables control; Optical waveguides; Particle beam optics; Photoluminescence; Photonics; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Future of Electron Devices, 2004. International Meeting for
  • Print_ISBN
    0-7803-8423-7
  • Electronic_ISBN
    0-7803-8424-5
  • Type

    conf

  • DOI
    10.1109/IMFEDK.2004.1566411
  • Filename
    1566411