DocumentCode
2874201
Title
Difference in structural stability between SrBi2Ta2O9 and Bi4-xLaxTi3O12 under vacuum and high temperature annealing stress
Author
Tatsumi, Naoyuki ; Tamai, Shin-Ichi ; Kobayashi, Hiroyuki ; Maeda, Yoshihito ; Nozawa, Hiroshi
Author_Institution
Dept. of Energy Sci. & Technol., Kyoto Univ., Japan
fYear
2004
fDate
26-28 July 2004
Firstpage
89
Lastpage
90
Abstract
It has been reported that less fatigue behaviors and low leakage currents of SrBi2Ta2O9 (SBT) and Bi4-xLaxTi3O12 (BLT) rise from oxygen ion compensation from the (Bi2O2)+ layer to the perovskite lattice. In this study, the structural changes (phase transitions and local structures) of SBT and BLT after annealing in vacuum were studied to examine the crucial factor for their structural stability.
Keywords
bismuth compounds; fatigue; ferroelectric semiconductors; lanthanum compounds; leakage currents; rapid thermal annealing; stress effects; strontium compounds; substrates; tantalum compounds; titanium compounds; BLT; BiLaTi3O12; SBT; SrBi2Ta2O9; fatigue behaviors; high temperature annealing stress; leakage currents; local structures; perovskite lattice; phase transitions; structural stability; vacuum stress; Bismuth; Crystallization; Ferroelectric films; Rapid thermal annealing; Stability; Stress; Structural engineering; Temperature; X-ray diffraction; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Future of Electron Devices, 2004. International Meeting for
Print_ISBN
0-7803-8423-7
Electronic_ISBN
0-7803-8424-5
Type
conf
DOI
10.1109/IMFEDK.2004.1566422
Filename
1566422
Link To Document