DocumentCode :
2874365
Title :
Numerical simulation of MOS capacitance for a wide range of temperatures, impurity profiles and surface state densities
Author :
Jaeger, Richard C. ; Diehl, Stephan ; Gaensslen, F.
Author_Institution :
Auburn University, Auburn, AL, USA
Volume :
XXV
fYear :
1982
fDate :
10-12 Feb. 1982
Firstpage :
14
Lastpage :
15
Abstract :
This report will describe a method for the numerical evaluation of the capacitance of MOS structures as a function of temperature for arbitrary impurity profiles and surface state distributions.
Keywords :
Capacitance; Capacitance-voltage characteristics; Difference equations; Differential equations; Electrons; MOS devices; Numerical simulation; Poisson equations; Semiconductor impurities; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1982 IEEE International
Conference_Location :
San Francisco, CA, USA
Type :
conf
DOI :
10.1109/ISSCC.1982.1156349
Filename :
1156349
Link To Document :
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