Title :
Microfabrication of 3-dimensional photoresist structures using selective patterning and development on two types of specific resists and its application to microfluidic components
Author :
Yun, Kwang-Seok ; Yoon, Euisik
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Abstract :
This paper reports a new technology for the formation of various 3-dimensional positive photoresist structures with simple photolithography by using UV-insensitive sacrificial photoresist and its selective development in specific developer solution with combination of multi-exposure and single development technique. We have successfully implemented various 3-dimensional photoresist structures including recessed cantilevers, suspended bridges and complex plates with micro-pits or micro-villi, which are utilized as micro master molds for PDMS microfluidic components.
Keywords :
microfluidics; photoresists; polymer films; 3 dimensional photoresist structures; PDMS microfluidic components; UV-insensitive sacrificial photoresist; cantilevers; microfabrication; micromaster molds; micromechanical devices; micropits; patterning; photolithography; Application software; Bridges; Glass; Lithography; Microfluidics; Resists; Shape; Stacking; Telephony; Wafer bonding;
Conference_Titel :
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN :
0-7803-8265-X
DOI :
10.1109/MEMS.2004.1290695
