• DocumentCode
    2874559
  • Title

    The effect of hydrogenous species on the properties and reliability of the dielectrics and metals used in multilevel metallization

  • Author

    Murarka, Shyam P.

  • Author_Institution
    Rensselaer Polytechnic institute
  • fYear
    1994
  • fDate
    1994
  • Firstpage
    37104
  • Lastpage
    38200
  • Keywords
    Annealing; Chemical vapor deposition; Dielectrics; Electromigration; Gold; Hydrogen; Impurities; Mechanical factors; Metallization; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.771269
  • Filename
    771269
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2874559