• DocumentCode
    2874628
  • Title

    The characteristics of ammonia-annealed polysilicon thin-film transistors with plasma hydrogenation

  • Author

    Yang, Chien Kuo ; Lei, Tan Fu ; Lee, Chung Len

  • Author_Institution
    National Chiao Tung University
  • fYear
    1994
  • fDate
    1994
  • Firstpage
    42952
  • Lastpage
    44048
  • Keywords
    Annealing; Degradation; Dielectrics; Leakage current; Nitrogen; Plasma applications; Plasma devices; Plasma properties; Thin film transistors; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.771273
  • Filename
    771273
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2874628