Title :
Characteristics of amorphous tungsten nitride diffusion barrier for metal-organic chemical vapor deposited Cu metallization
Author :
Kim, Yong Tae ; Lee, Chang Woo ; Kwon, Chul Soon ; Min, Suk-Ki ; Park, Sang Kyu
Author_Institution :
Pohang Institute of Science and Technology
Keywords :
Amorphous materials; Chemical technology; Conductivity; Copper; Metallization; Semiconductor films; Sputtering; Substrates; Tungsten; X-ray scattering;
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
DOI :
10.1109/EDMS.1994.771274
