Ultra shallow n/sup+//p junctions formed by out-diffusion from TiSi₂ with an amorphous silicon buffer layer

Author

Huang, Cheng Tung ; Yang, Wen Luh ; Shieh, Tsong Min ; Lei, Tan Fu

Author_Institution

National Chiao Tung University

fYear

1994

fDate

1994

Firstpage

45876

Lastpage

46606

Keywords

Annealing; Buffer layers; Conductivity; Contact resistance; Diodes; Electric variables; Leakage current; Silicidation; Silicides; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International

Type

DOI

10.1109/EDMS.1994.771275

Filename

771275

Link To Document