DocumentCode :
2875411
Title :
High quality thin oxide films formed by using ultra low temperature liquid phase deposition
Author :
Yeh, Ching-Fa ; Lin, Shyue-Shyh ; Hong, Tzy-Yan
Author_Institution :
National Chiao-Tung University
fYear :
1994
fDate :
1994
Firstpage :
28815
Lastpage :
29911
Keywords :
Dielectric liquids; Dielectric thin films; Electric breakdown; Etching; Leakage current; Optical films; Silicon compounds; Substrates; Surface topography; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
Type :
conf
DOI :
10.1109/EDMS.1994.771352
Filename :
771352
Link To Document :
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