• DocumentCode
    2875430
  • Title

    Factors influencing the oxidation of silicon catalyzed by Cu3Si at room temperature

  • Author

    Liu, C.S. ; Chen, L.J.

  • Author_Institution
    National Tsing Hua University
  • fYear
    1994
  • fDate
    1994
  • Firstpage
    30277
  • Lastpage
    31373
  • Keywords
    Electrons; Grain boundaries; Grain size; Oxidation; Semiconductor films; Silicides; Silicon; Substrates; Temperature; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Materials Symposium, 1994. EDMS 1994. 1994 International
  • Type

    conf

  • DOI
    10.1109/EDMS.1994.771353
  • Filename
    771353