Title :
A 16ns 16K bipolar RAM
Author :
Kato, Yu ; Odaka, M. ; Ogiue, K. ; Miwa, H. ; Matsumura, Kohei
Author_Institution :
Hitachi Development Center, Tokyo, Japan
Abstract :
A 16ns 150mW ECL compatible static RAM will be described. Cell and die size of 569μm2and 16.4mm2have been achieved with oxide-isolated poly silicon-walled emitter transistors.
Keywords :
Capacitance; Frequency; Iron; MOS devices; Random access memory; Read-write memory; Solid state circuits; Voltage;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1983 IEEE International
Conference_Location :
New York, NY, USA
DOI :
10.1109/ISSCC.1983.1156440