Title :
Building block approach and variable size memory for CMOS VLSIs
Author :
Koide, K. ; Ohba, Tsuyoshi ; Ikuzaki ; Fujita, Masayuki ; Masaki, A. ; Kato, Masaaki ; Murata, Shotaro
Author_Institution :
Hitachi Device Development Center, Tokyo, Japan
Abstract :
This report will discuss 10K to 20K CMOS VLSIs with a building block approach suitable for high speed and automated design. To accommodate diversified designers´ demands, RAMs and ROMs have been designed to be size variable and applicable to the DA system. Three hierarchical levels are cell, block and chip. Two layer metals (aluminum) and one layer (poly-Si) were used for wiring.
Keywords :
Circuits; Delay; Design automation; Random access memory; Read only memory; Read-write memory; Routing; System testing; Very large scale integration; Wiring;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1983 IEEE International
Conference_Location :
New York, NY, USA
DOI :
10.1109/ISSCC.1983.1156509