DocumentCode
2877204
Title
Design and Fabrication of Micro-System Embedding in Flexible Substrates
Author
Wang, L. ; Zoumpoulidis, T. ; Bartek, M. ; Jansen, K.M.B. ; Ernst, L.J. ; Zhang, G.Q.
Author_Institution
Delft Univ. of Technol., Delft
fYear
2007
fDate
May 29 2007-June 1 2007
Firstpage
311
Lastpage
315
Abstract
The possibility to conform microelectronic circuits onto non-planar or even high-curvature surfaces is of increasing interest for future applications. A promising flexible substrate concept based on vertical thinning/lateral partitioning and the substrate transfer technology is developed. Test structures for flexibility testing which consist of a partitioned ultra-thin poly-silicon layer sandwiched between 300 nm thermal and 500 nm PECVD silicon dioxide layers were designed and fabricated. These test structures were embedded into a soft material layer (polyimide). The results of bending tests around cylinders showed that the flexible structures could easily withstand the bending around a cylinder with diameter of 2 mm. The onset of cracks was detected in the dielectric layers (silicon oxide) region between the silicon segments, therefore second generation samples were designed with the silicon oxide between the segments removed. The wave-shape flexible interconnects with different parameters were also designed for signal communication between the functional silicon segments. The resistances of vertical and parallel paths were measured during the tensile tests with a custom designed setup which also allows optical observation. Multi-level FEM simulations were performed in order to increase understanding of the major failure processes. The correspondence between simulation and measurement results provides a good knowledge base for the further optimization of the embedded flexible structures.
Keywords
bending; chemical vapour deposition; crack detection; dielectric materials; finite element analysis; flexible electronics; micromechanical devices; silicon compounds; substrates; tensile testing; FEM simulations; PECVD silicon dioxide layers; bending tests; crack detection; dielectric layers; flexibility testing; lateral partitioning; microsystem design; microsystem fabrication; resistance measurement; signal communication; size 2 mm; size 300 nm; size 500 nm; substrate transfer technology; tensile tests; vertical thinning; wave-shape flexible interconnects; Circuit testing; Dielectric materials; Electrical resistance measurement; Fabrication; Flexible structures; Materials testing; Microelectronics; Optical surface waves; Polyimides; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
Conference_Location
Reno, NV
ISSN
0569-5503
Print_ISBN
1-4244-0985-3
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2007.373815
Filename
4249901
Link To Document