Title :
Nanostructure fabrication using nanosphere lithography for photonics devices
Author :
Wang, Jinsong ; Mao, Guangzhao ; Zhao, Yang
Author_Institution :
Dept. of Electr. & Comput. Eng., Wayne State Univ., Detroit, MI
Abstract :
We use the self-assembled polystyrene nanosphere monolayer pattern to replace photoresist mask for the fabrication of 2D nanostructures on various substrates. The optical properties of these artificial structures are measured and compared with theoretical calculation.
Keywords :
masks; monolayers; nanofabrication; nanolithography; nanophotonics; optical fabrication; optical polymers; photoresists; self-assembly; 2D nanostructure fabrication; artificial structures; nanosphere lithography; optical properties; photonic device; photoresist mask; self-assembled polystyrene nanosphere monolayer pattern; Etching; Fabrication; Gratings; Lithography; Nanoscale devices; Optical materials; Optical refraction; Periodic structures; Photonics; Self-assembly;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4628624
