DocumentCode
2877606
Title
Nanostructure fabrication using nanosphere lithography for photonics devices
Author
Wang, Jinsong ; Mao, Guangzhao ; Zhao, Yang
Author_Institution
Dept. of Electr. & Comput. Eng., Wayne State Univ., Detroit, MI
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
We use the self-assembled polystyrene nanosphere monolayer pattern to replace photoresist mask for the fabrication of 2D nanostructures on various substrates. The optical properties of these artificial structures are measured and compared with theoretical calculation.
Keywords
masks; monolayers; nanofabrication; nanolithography; nanophotonics; optical fabrication; optical polymers; photoresists; self-assembly; 2D nanostructure fabrication; artificial structures; nanosphere lithography; optical properties; photonic device; photoresist mask; self-assembled polystyrene nanosphere monolayer pattern; Etching; Fabrication; Gratings; Lithography; Nanoscale devices; Optical materials; Optical refraction; Periodic structures; Photonics; Self-assembly;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4628624
Filename
4628624
Link To Document