Title :
A 20K gate CMOS gate array
Author :
Saigo, Tatsuya ; Tago, H. ; Shiochi, M. ; Hiwatashi, T. ; Shima, Shohei ; Moriya, Takehiro
Author_Institution :
Toshiba Research and Development Center, Kawasaki, Japan
Keywords :
Delay effects; Etching; Hydrogen; Integrated circuit interconnections; Length measurement; Metallization; Ring oscillators; Semiconductor device measurement; Silicon compounds; Time measurement;
Conference_Titel :
Solid-State Circuits Conference. Digest of Technical Papers. 1983 IEEE International
Conference_Location :
New York, NY, USA
DOI :
10.1109/ISSCC.1983.1156545