Title :
Domain engineering in LiTaO3 by focused charge beam: From micro to nano scale
Author :
Li, Xijun ; Terabe, Kazuya ; Hatano, Hideki ; Kitamura, Kenji
Author_Institution :
Nat. Inst. for Mater. Sci., Tsukuba
Abstract :
In this study, 1-mum-dot domain by resist-assisted electron beam writing and 100-nm-wide line domain by focused ion beam domain patterning techniques have been demonstrated in LiNbO3 and LiTaO3 crystals thicker than tens of mum.
Keywords :
electric domains; electron resists; ferroelectric materials; focused ion beam technology; lithium compounds; microfabrication; nanofabrication; nanopatterning; optical materials; LiNbO3; LiTaO3; domain engineering; ferroelectric domains; focused charge beam; focused ion beam domain patterning techniques; microfabrication; nanofabrication; resist-assisted electron beam writing; Electron beams; Electron optics; Ferroelectric materials; High speed optical techniques; Ion beams; Nonlinear optical devices; Optical modulation; Photonic crystals; Resists; Writing; 160.2260; 160.3730;
Conference_Titel :
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location :
Long Beach, CA
Print_ISBN :
978-1-55752-813-1
Electronic_ISBN :
978-1-55752-813-1
DOI :
10.1109/CLEO.2006.4628642
