• DocumentCode
    2877958
  • Title

    Domain engineering in LiTaO3 by focused charge beam: From micro to nano scale

  • Author

    Li, Xijun ; Terabe, Kazuya ; Hatano, Hideki ; Kitamura, Kenji

  • Author_Institution
    Nat. Inst. for Mater. Sci., Tsukuba
  • fYear
    2006
  • fDate
    21-26 May 2006
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    In this study, 1-mum-dot domain by resist-assisted electron beam writing and 100-nm-wide line domain by focused ion beam domain patterning techniques have been demonstrated in LiNbO3 and LiTaO3 crystals thicker than tens of mum.
  • Keywords
    electric domains; electron resists; ferroelectric materials; focused ion beam technology; lithium compounds; microfabrication; nanofabrication; nanopatterning; optical materials; LiNbO3; LiTaO3; domain engineering; ferroelectric domains; focused charge beam; focused ion beam domain patterning techniques; microfabrication; nanofabrication; resist-assisted electron beam writing; Electron beams; Electron optics; Ferroelectric materials; High speed optical techniques; Ion beams; Nonlinear optical devices; Optical modulation; Photonic crystals; Resists; Writing; 160.2260; 160.3730;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
  • Conference_Location
    Long Beach, CA
  • Print_ISBN
    978-1-55752-813-1
  • Electronic_ISBN
    978-1-55752-813-1
  • Type

    conf

  • DOI
    10.1109/CLEO.2006.4628642
  • Filename
    4628642
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2877958