DocumentCode
2878009
Title
Superresolution image enhancement in digital photomicrography by subpixel translation using a scanning micromirror
Author
Yu, Kyoungsik ; Park, Namkyoo ; Lee, Daesung ; Solgaard, Olav
Author_Institution
Korea Electr. Eng. & Sci. Res. Inst., Seoul Nat. Univ., Seoul
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
We report on a superresolution image enhancement technique that can improve the spatial resolution of digital photomicrography employing typical pixelated image sensors. A bulk-micromachined micromirror is used to control the image location with subpixel accuracy.
Keywords
digital photography; image enhancement; image resolution; image sensors; micromirrors; bulk-micromachined micromirror; digital photomicrography; image location; pixelated image sensors; spatial resolution; subpixel accuracy; superresolution image enhancement; Image enhancement; Image resolution; Image sensors; Micromirrors; Optical films; Optical sensors; Optical signal processing; Photomicrography; Signal resolution; Spatial resolution; (100.2980) Image enhancement; (100.6640) Superresolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4628646
Filename
4628646
Link To Document