DocumentCode :
2878613
Title :
Self-Assembly Process for Chip-to-Wafer Three-Dimensional Integration
Author :
Fukushima, T. ; Yamada, Y., II ; Kikuchi, H. ; Tanaka, T. ; Koyanagi, M.
Author_Institution :
Tohoku Univ., Sendai
fYear :
2007
fDate :
May 29 2007-June 1 2007
Firstpage :
836
Lastpage :
841
Abstract :
We have proposed chip-to-wafer stacking for three-dimensional (3D) integration. To realize the chip-to-wafer 3D integration, five key technologies of through-Si interconnection and microbump formation, chip-to-wafer alignment, underfilling, and chip thinning were investigated. Three-layer stacked chips with a layer thickness of several tens microns were fabricated by using the key technologies. Each chip was serially and mechanically aligned and bonded onto a support LSI wafer. In addition, we newly introduce a stacking technique using self-assembly as a key process for advanced chip-to-wafer 3D integration. High-precision alignment with an accuracy of within 1 mum was obtained and stacking throughput can be dramatically improved by the self-assembly.
Keywords :
self-assembly; wafer bonding; wafer level packaging; wafer-scale integration; chip thinning; chip-to-wafer 3D integration; chip-to-wafer alignment; chip-to-wafer stacking; microbump formation; self-assembly process; stacking technique; three-dimensional integration; through-Si interconnection; underfilling; Assembly; Etching; Fabrication; Large scale integration; Production; Self-assembly; Stacking; Testing; Throughput; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
Conference_Location :
Reno, NV
ISSN :
0569-5503
Print_ISBN :
1-4244-0985-3
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2007.373895
Filename :
4249981
Link To Document :
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