• DocumentCode
    2878613
  • Title

    Self-Assembly Process for Chip-to-Wafer Three-Dimensional Integration

  • Author

    Fukushima, T. ; Yamada, Y., II ; Kikuchi, H. ; Tanaka, T. ; Koyanagi, M.

  • Author_Institution
    Tohoku Univ., Sendai
  • fYear
    2007
  • fDate
    May 29 2007-June 1 2007
  • Firstpage
    836
  • Lastpage
    841
  • Abstract
    We have proposed chip-to-wafer stacking for three-dimensional (3D) integration. To realize the chip-to-wafer 3D integration, five key technologies of through-Si interconnection and microbump formation, chip-to-wafer alignment, underfilling, and chip thinning were investigated. Three-layer stacked chips with a layer thickness of several tens microns were fabricated by using the key technologies. Each chip was serially and mechanically aligned and bonded onto a support LSI wafer. In addition, we newly introduce a stacking technique using self-assembly as a key process for advanced chip-to-wafer 3D integration. High-precision alignment with an accuracy of within 1 mum was obtained and stacking throughput can be dramatically improved by the self-assembly.
  • Keywords
    self-assembly; wafer bonding; wafer level packaging; wafer-scale integration; chip thinning; chip-to-wafer 3D integration; chip-to-wafer alignment; chip-to-wafer stacking; microbump formation; self-assembly process; stacking technique; three-dimensional integration; through-Si interconnection; underfilling; Assembly; Etching; Fabrication; Large scale integration; Production; Self-assembly; Stacking; Testing; Throughput; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
  • Conference_Location
    Reno, NV
  • ISSN
    0569-5503
  • Print_ISBN
    1-4244-0985-3
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2007.373895
  • Filename
    4249981