DocumentCode :
2879334
Title :
Preparation of Superhydrophobic Silica Thin Films for Antistiction of MEMS Devices Using a Novel Sol-Gel Process
Author :
Xiu, Yonghao ; Zhu, Lingbo ; Hess, Dennis W. ; Wong, C.P.
Author_Institution :
Georgia Inst. of Technol., Atlanta
fYear :
2007
fDate :
May 29 2007-June 1 2007
Firstpage :
1135
Lastpage :
1142
Abstract :
Based on the theory of superhydrophobicity for low surface energy coatings, we describe a superhydrophobic antistiction silica coating for MEMS devices. The process uses a novel sol-gel process sequence with a eutectic liquid as a templating agent. The eutectic liquid displays negligible vapor pressure and very low melting point (12degC at ambient conditions) to reduce solvent loss during the high speed spincoating process. After a fluoroalkyl silane treatment, superhydrophobicity is achieved on the as-prepared silica thin film. The solvent can be extracted after the gelation and aging processes. Spin speed effect, eutectic liquid:TEOS ratio in the solution were systematically studied in order to optimize the surface roughness to ensure excellent super-hydrophobicity. Comparison of the silica thin films with silicon pillar surfaces showed that superhydrophobicity for the traditional sol-gel derived silica films demonstrated significant improvement, especially under humid conditions. The AFM force curve obtained with a tipless probe showed that the interaction force is greatly reduced on a rough silica superhydrophobic surface. This result offers great potential to reduce stiction failures in MEMS devices.
Keywords :
atomic force microscopy; micromechanical devices; semiconductor thin films; silicon compounds; sol-gel processing; spin coating; surface roughness; AFM force curve; MEMS devices; SiO2; eutectic liquid displays; fluoroalkyl silane treatment; low surface energy coatings; silica coating; silica thin films; sol-gel process; spin coating process; superhydrophobic antistiction; superhydrophobicity; surface roughness; Atomic force microscopy; Coatings; Displays; Microelectromechanical devices; Rough surfaces; Silicon compounds; Solvents; Surface roughness; Thin film devices; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
Conference_Location :
Reno, NV
ISSN :
0569-5503
Print_ISBN :
1-4244-0985-3
Electronic_ISBN :
0569-5503
Type :
conf
DOI :
10.1109/ECTC.2007.373938
Filename :
4250024
Link To Document :
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