DocumentCode :
2880256
Title :
Studies of electronegative Ar/O2 discharge in a constricted hollow anode plasma source using dual probe technique
Author :
Mujawar, M.A. ; Karkari, S.K. ; Turner, M.M.
Author_Institution :
Nat. Center for Plasma Sci. & Technol., Dublin City Univ., Dublin, Ireland
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. Uniform high density electronegative plasmas find important application for plasma heating by neutral beams in fusion devices and in material processing. In this work we present a constricted hollow anode plasma source (CHAPS) for the investigation of electronegative Ar/O2 discharge. The source consists of a series of equidistant stainless steel parallel plates acting as cathode with a small stainless steel tube as the anode. The plasma comprise of highly uniform density outside the cathode plates and an intense glow near the anode1. The negative oxygen ion fraction is determined by measuring the electron density by hairpin probe and ion density using a planer Langmuir probe. The negative ion density in the bulk plasma is typically 1016 m-3 and increases monotonically as a function of pressure and power. The electronegativity of the discharge is typically close to 0.5 and remains constant with the applied power. Whereas the negative ion density in the anode region varies from 1016 m-3 to 1017 m-3 with electronegativity of 3.0 near the edge of the anodic glow and decreases to 1.0 with the distance from the anode glow.
Keywords :
Langmuir probes; argon; electronegativity; glow discharges; oxygen; plasma density; plasma pressure; plasma sources; stainless steel; Ar-O2; anodic glow edge region; dual probe technique; electron density; electronegative discharge; fusion device; glow discharge; hairpin probe; hollow anode plasma source; material processing; negative ion density; planer Langmuir probe; plasma heating process; stainless steel parallel plates; uniform high density electronegative plasma; Anodes; Density measurement; Plasma measurements; Plasma properties;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5992980
Filename :
5992980
Link To Document :
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