• DocumentCode
    2880382
  • Title

    Optimization of dense plasma focus for higher neutron yield

  • Author

    Hassan, S.M. ; Lee, P. ; Rawat, R.S. ; Lee, S. ; Saw, S.H. ; Tatarakis, M. ; Harilal, S.S. ; Hassanein, A.

  • Author_Institution
    Sch. of Nucl. Eng., Purdue Univ., West Lafayette, IN, USA
  • fYear
    2011
  • fDate
    26-30 June 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. The optimization of a dense plasma focus for higher neutron or X-rays yield is dependent on a number of factors such as the geometry and structure of inner and outer electrodes, length and material of an insulator sleeve, type and pressure of a filling gas, rate of discharge current, and the electrode polarity. These parameters are interrelated in a complicated way in order to get good pinching current or peak tube current Ip. Plasma focus fusion yields on a wide range of plasma focus devices have been reported to scale simply with Ip, such as Ip. This is consistent with a plasma with the same parameters (density, and temperature) scaling with size of plasma which in theory should give a scaling law of Ip. The possibility of a scaling law with Ipn, for the value of n greater than 4, is explained in terms of the drive parameter and energy considerations. The required plasma energy for the higher neutron yield is estimated for few joules to mega-joules plasma focus devices. The results show that the yield saturation effect is significant for mega-ampere devices with mega-joule energies. For small plasma foci, applications drive the need for high neutron yield rate instead of yield per shot. We discuss the limitations of small high repetition rate plasma focus devices and propose new experiments to confirm and break the neutron yield limits of both high and low energy plasma focus devices. These experiments would also be helpful to find the best scaling parameters for the X-rays in a low energy plasma focus device.
  • Keywords
    discharges (electric); pinch effect; plasma X-ray sources; plasma density; plasma focus; plasma temperature; plasma transport processes; X-ray scaling parameter; X-ray yield analysis; dense plasma focus optimization; discharge current rate; electrode polarity analysis; high neutron yield rate; inner electrode structure; low energy plasma focus device; mega-ampere plasma focus device; mega-joule plasma focus device; outer electrode structure; pinching current analysis; plasma density; plasma temperature; scaling law; Educational institutions; Electrodes; Materials; Neutrons; Physics; Plasmas; X-rays;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
  • Conference_Location
    Chicago, IL
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-61284-330-8
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2011.5992987
  • Filename
    5992987