Title :
An atmospheric pressure non-thermal plasma needle for endodontic biofilm disinfection
Author :
Jiang, C. ; Gundersen, M.A. ; Schaudinn, C. ; Webster, P. ; Jaramillo, D.E. ; Sedghizadeh, P.P. ; Costerton, J.W.
Author_Institution :
Dept. of EE-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
Abstract :
Summary form only given. A pulsed, needle-like plasma jet was generated for root canal disinfection. Up to 3 cm long, <;1 mm in diameter, the plasma needle was powered with ~100 ns, 1-2 kHz, multi-kilovolt electric pulses and filled with 1 standard liter per minute He/(1%)O2 flow. This low power, pulsed, plasma jet consists of ionization fronts propagating away from both electrodes at speeds of the order of 107 cm/s. Plasma treatment of Enterococcus faecalis biofilms on hydroxyapatite (HA) discs for 5 min resulted in 93% kill. Scanning electron microscopy revealed nearly no intact bacteria were discernible for the plasma exposed HA disc surfaces. Similar plasma jets were applied for salivary biofilm-colonized root canal disinfection. After 5 min plasma treatment, removal of the biofilm for a depth of 1 mm and cleared dentinal surfaces were observed. The demonstrated antimicrobial effect of the plasma against endodontic biofilms suggests that the non-thermal plasma-based technology could be a possible alternative or supplement to existing protocols for root canal disinfection.
Keywords :
antibacterial activity; dentistry; plasma jets; plasma materials processing; plasma sources; scanning electron microscopy; Enterococcus faecalis biofilms; antimicrobial effect; atmospheric pressure nonthermal plasma needle endodontic biofilm disinfection; biofilm removal; dentinal surfaces; depth 1 mm; endodontic biofilms; frequency 1 kHz to 2 kHz; hydroxyapatite discs; ionization fronts; needle-like plasma jet; nonthermal plasma-based technology; plasma exposed HA disc surfaces; plasma treatment; salivary biofilm-colonized root canal disinfection; scanning electron microscopy; time 5 min; Helium; Needles; Plasmas;
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2011.5993048