DocumentCode
2881668
Title
Verification of collisionless model of capacitive rf discharges by particle-in-cell simulations
Author
Wang, Y. ; Lieberman, M.A. ; Wu, A. ; Verboncoeur, J.P.
Author_Institution
UC Berkeley, Berkeley, CA, USA
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. A model for high voltage rf capacitive discharges in the collisionless sheath regime is verified by particle-in-cell (PIC) simulations, both for current- and voltage-driven sources. The ion energy distributions (IEDs) and the IED widths ΔEi are investigated and show good agreement with the Benoit-Cattin and Bernard theoretical model, with proper adjustment of the dc bias voltage. Sensitivities of sources (current or voltage driven) to IEDs are described. It is found that for the same variations of rf source amplitudes, larger voltage shifts are expected in the IEDs for current-driven than voltage-driven cases. Effects of rf frequencies on IEDs are observed for a fixed rf voltage-driven source amplitude. The IEDs show a surprising independence on the rf frequencies, which can be understood reasonably well by the combined scalings of the global discharge model and Benoit-Cattin and Bernard theoretical model.
Keywords
high-frequency discharges; plasma sheaths; plasma simulation; plasma sources; Benoit-Cattin theoretical model; Bernard theoretical model; capacitive rf discharges; collisionless model; collisionless sheath regime; current-driven sources; dc bias voltage; global discharge model; ion energy distributions; particle-in-cell simulations; voltage shifts; voltage-driven sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993071
Filename
5993071
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