• DocumentCode
    2881704
  • Title

    A Design Methodology for the Yield Enhancement of MEMS Designs with Respect to Process Induced Variations

  • Author

    Vudathu, Shyam Praveen ; Laur, Rainer

  • Author_Institution
    Univ. of Bremen, Bremen
  • fYear
    2007
  • fDate
    May 29 2007-June 1 2007
  • Firstpage
    1947
  • Lastpage
    1952
  • Abstract
    The intricacy in the manufacturing of MEMS devices has resulted in decreasing parametric yields. The problem of reduced parametric yield is increasing with the waning feature sizes. The necessity for yield enhancement in MEMS designs and particularly in commercial MEMS is being increasingly felt by the industry and therefore by the designers. There has been no standard methodology that could be followed to enhance yield in the design phase. In this paper we undertake effort in order to standardize a best practice design method in order to achieve a better yield in the design phase. The method is still in its infancy and has good scope for development. The validity of the proposed method is demonstrated via a simulation based approach on a U-Shaped micro electro thermal actuator.
  • Keywords
    micromechanical devices; MEMS design; MEMS device manufacturing; parametric yield; process induced variation; yield enhancement; Best practices; Design methodology; Fabrication; Manufacturing industries; Microelectromechanical devices; Microelectronics; Micromechanical devices; Process design; Robustness; Standardization; Design Methodologies; MEMS; Process Induced Variations; Yield Enhancement in MEMS; Yield Sensitive Parameters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
  • Conference_Location
    Reno, NV
  • ISSN
    0569-5503
  • Print_ISBN
    1-4244-0985-3
  • Electronic_ISBN
    0569-5503
  • Type

    conf

  • DOI
    10.1109/ECTC.2007.374067
  • Filename
    4250153