DocumentCode
2881704
Title
A Design Methodology for the Yield Enhancement of MEMS Designs with Respect to Process Induced Variations
Author
Vudathu, Shyam Praveen ; Laur, Rainer
Author_Institution
Univ. of Bremen, Bremen
fYear
2007
fDate
May 29 2007-June 1 2007
Firstpage
1947
Lastpage
1952
Abstract
The intricacy in the manufacturing of MEMS devices has resulted in decreasing parametric yields. The problem of reduced parametric yield is increasing with the waning feature sizes. The necessity for yield enhancement in MEMS designs and particularly in commercial MEMS is being increasingly felt by the industry and therefore by the designers. There has been no standard methodology that could be followed to enhance yield in the design phase. In this paper we undertake effort in order to standardize a best practice design method in order to achieve a better yield in the design phase. The method is still in its infancy and has good scope for development. The validity of the proposed method is demonstrated via a simulation based approach on a U-Shaped micro electro thermal actuator.
Keywords
micromechanical devices; MEMS design; MEMS device manufacturing; parametric yield; process induced variation; yield enhancement; Best practices; Design methodology; Fabrication; Manufacturing industries; Microelectromechanical devices; Microelectronics; Micromechanical devices; Process design; Robustness; Standardization; Design Methodologies; MEMS; Process Induced Variations; Yield Enhancement in MEMS; Yield Sensitive Parameters;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Components and Technology Conference, 2007. ECTC '07. Proceedings. 57th
Conference_Location
Reno, NV
ISSN
0569-5503
Print_ISBN
1-4244-0985-3
Electronic_ISBN
0569-5503
Type
conf
DOI
10.1109/ECTC.2007.374067
Filename
4250153
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