Title :
Al/Al2O3 micro channel plasma chemical reactor for ozone synthesis
Author :
Cho, J.H. ; Kim, M.H. ; Kim, S.H. ; Park, S.-J. ; Eden, J.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
Abstract :
Summary form only given. Arrays of low temperature microplasma channels have been demonstrated for on-chip chemical synthesis in an atmospheric pressure gas environment. Plasma channels with widths of a 200-300 μm and lengths up to 50 mm have been generated on a flowing state basis in sealed microchannels fabricated by micropowder blasting and wet chemical process. The total effective plasma reaction volume in the current device design is 1~15 mm3.These channels are situated in a dielectric barrier structure having a buried electrode geometry fabricated on 125-250 μm thick Al foil and the microplasmas are sustained in air, O2 and water vapor flows at atmospheric pressure. When the 6 individual channels were operated for O3 synthesis, an ozone concentration of 3-15 mg/1 is produced with a 20 kHz sinusoidal voltage (RMS) of 2.5-3.2 kV and at a flow rate of feedstock gases of 0.1-1.5 L/min. The performance of the device in relation to electrode geometry, discharge volume and parallel operation of the array will be discussed.
Keywords :
alumina; aluminium; electrodes; microchannel flow; microreactors; ozone generators; plasma applications; plasma chemistry; plasma devices; plasma flow; Al-Al2O3; O3; current device design; dielectric barrier structure; discharge volume; electrode geometry; frequency 20 kHz; low-temperature microplasma channels; microchannel plasma chemical reactor; microplasmas; micropowder blasting; on-chip chemical synthesis; ozone concentration; ozone synthesis; plasma reaction volume; pressure 1 atm; sinusoidal voltage; size 125 mum to 300 mum; voltage 2.5 kV to 3.2 kV; water vapor flows; wet chemical process; Chemical reactors; Plasmas;
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2011.5993104
