DocumentCode
2882922
Title
Two dimensional Child-Langmuir law for a sharp field emitter
Author
Sun Song ; Ang, L.K.
Author_Institution
Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Space-Charge-Limited (SCL) electron flow describes the maximum current density allowed for electron transport across a planar gap. It has been an active research in the development of Non-neutral plasma physics, high current diodes, high power microwave sources, vacuum microelectronics, and sheath physics in plasma processing. Although the transition from field emission or Fowler-Nordheim (FN) law to Child-Langmuir (CL) law has been studied before, the models do not include the effect of the emitter sharpness. In this paper, we are interested to develop a protrusive CL law to account for the sharpness of emitter. In this paper, a protrusive model of the Child-Langmuir (CL) law is proposed for non-uniform electron field emission from a sharp tip of either Lorentzian or hyberboloid shape. The model is expressed as JPCL = μx Jcl at a large electric field higher than a critical value of Ec and Jcl is the 1D classical CL law. Here, the enhancement factor depends only on the calculate fiddle enhancement factor (β), independent of work work function and gap spacing. In particular, μ increases with β and it converges to a constant at β>;>;1 for a very sharp tip with small emission area. The calculations are compared with particle-in-cell simulation for a circular patch with arbitrary emission area.
Keywords
field emission; plasma flow; plasma simulation; plasma transport processes; space charge; work function; Fowler-Nordheim law; field emission; high-current diodes; high-power microwave sources; nonneutral plasma physics; nonuniform electron field emission; particle-in-cell simulation; plasma processing; protrusive model; sharp field emitter; space-charge-limited electron flow; two-dimensional Child-Langmuir law; vacuum microelectronics; work function; Educational institutions;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993166
Filename
5993166
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