• DocumentCode
    2883733
  • Title

    A new RF capacitance method to extract the effective channel length of MOSFET´s using S-parameters

  • Author

    Lee, Seonghearn

  • Author_Institution
    Dept. of Electron. Eng., Hankuk Univ. of Foreign Studies, Yongin, South Korea
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    56
  • Lastpage
    59
  • Abstract
    A simple and accurate extraction of the effective channel length is carried out by utilizing the slope information of the the intrinsic gate-to-channel capacitance versus the mask gate length of ultra short-channel devices. The measurement setup where the gate is connected to a RF signal is used to remove the discrepancy problem between conventional I-V and C-V methods. In order to increase the measurement accuracy, the intrinsic gate-to-channel capacitance data are determined by calibrating S-parameter sets measured at GHz using zero-bias data, instead of low-frequency C-V measurements. Contrary to the conventional C-V method, this new RF C-V method results in much smaller deviation from the I-V method
  • Keywords
    MOSFET; S-parameters; capacitance; semiconductor device measurement; MOSFET; RF capacitance measurement; S-parameters; effective channel length; parameter extraction; ultra-short channel device; Capacitance measurement; Capacitance-voltage characteristics; Electrical resistance measurement; Frequency measurement; Length measurement; MOSFET circuits; Parasitic capacitance; Radio frequency; Scattering parameters; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2000. Proceedings. 2000 IEEE Hong Kong
  • Conference_Location
    Hong Kong
  • Print_ISBN
    0-7803-6304-3
  • Type

    conf

  • DOI
    10.1109/HKEDM.2000.904215
  • Filename
    904215