• DocumentCode
    2884548
  • Title

    Short circuit test - complete analysis for the dense plasma focus

  • Author

    Mohamed, A.E. ; Abdou, A.E. ; Ismail, M.I. ; Lee, S. ; Saw, S.H.

  • Author_Institution
    Dept. of Mech. & Nucl. Eng., Kansas State Univ., Manhattan, KS, USA
  • fYear
    2011
  • fDate
    26-30 June 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. The static impedance of the capacitor bank and external connections of the dense plasma focus has a great importance in the device performance. Previous works used approach formulas to find the machine static parameters. In this paper a complete RLC circuit analysis was performed to find exact formulas for the static impedance of the machine. Rogowski coil was used to measure the current waveform in a short circuit test for KSU-DPF. A nonlinear base shift of the integrated signal that expresses the current was noticed to deform the current waveform. This error was corrected by introducing three methods; digital filters, peak averaging method, and baseshift extrapolation. The three methods succeeded in removing the baseshift with different precisions. The RLC analysis used also to find an accurate calibration factor for Rogowski coil. A MathCAD program was developed to calculate the required parameters from the current waveform. The program treated the current as sinusoidal waveform modulated by decaying exponential function. The program was applied to find the impedance for the KSU-DPF. The static inductance for the machine was found to be 124.83nH, the static resistance 14.4mΩ, and Rogowski calibration factor 4.76×104.
  • Keywords
    CAD; RLC circuits; capacitors; coils; digital filters; electric impedance; extrapolation; physics computing; plasma focus; waveform analysis; MathCAD program; RLC circuit analysis; Rogowski calibration factor; Rogowski coil; baseshift extrapolation; calibration factor; capacitor bank; current waveform; decaying exponential function; dense plasma focus; digital filters; integrated signal; machine static parameters; nonlinear base shift; peak averaging method; resistance 14.4 mohm; short circuit test; sinusoidal waveform; static impedance; static resistance; Mechanical variables measurement; Nuclear measurements; Plasma measurements; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
  • Conference_Location
    Chicago, IL
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-61284-330-8
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2011.5993284
  • Filename
    5993284