DocumentCode
2884566
Title
Dynamics of a microscale dense plasma focus
Author
Pollard, W. ; Duggleby, A. ; Staack, D.
Author_Institution
Dept. of Mech. Eng., Texas A&M Univ., College Station, TX, USA
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Experimental results are presented for a sub-millimeter dense plasma focus (DPF). Reducing the DPF from cm to μm sizes allows for unique applications such as portable neutron based detectors. With smaller size efficiency is expected to increase, but total neutron emission will be lower. Challenges are maintaining the various scaling parameters. Breakdown scaling suggests higher pressure operation though there are limitations at high pressure in confinement due to increased collisions. Two DPF devices, one with a 750 μm copper anode radius and the other with a 100 μm tungsten anode radius, have been tested using a pulse generating system capable of up to 4 J/pulse with peak voltages of 20 kV and controllable voltage rise rates up to 20 kV/ns. An ICCD camera capable of 0.2 ns gating is used to acquire image series with high temporal resolution. Time resolved imaging of the DPF breakdown and rundown phases at various pressures and total energies, as shown in Figure 1, are used to determine the most suitable pinch conditions. The energy density and drive parameters are calculated for both DPF devices and compared to values typical of other pinch devices, such as the PF-400J and the PF-50J.
Keywords
anodes; cathodes; copper; electric breakdown; neutron detection; pinch effect; plasma focus; portable instruments; tungsten; Cu; DPF breakdown; DPF devices; PF-400J; PF-50J; W; breakdown scaling; copper anode; drive parameters; energy density; high temporal resolution; higher pressure operation; microscale dense plasma focus; neutron emission; pinch conditions; portable neutron based detectors; pulse generating system; rundown phases; size 100 mum; size 750 mum; time 0.2 ns; tungsten anode; voltage 20 kV; Copper;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993286
Filename
5993286
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